Hafnium Target

PorductHafnium Target
ApplicationOptical coating, semiconductor coating, etc.
PurityHf+Zr > 99.99%, Zr≤0.2%,0.3%&0.5%
ShapeRound,Board,Tube
StandardASTM B776
SizeCustomized

The hafnium target material is formed into products through multiple steps such as raw material smelting-forging-rolling-heat treatment-machining-flaw detection-surface finishing-cleaning.

Hafnium can react with air to form an oxide film protective layer. When the temperature is 500 to 750°C, the oxide film will lose its protective effect and will combine with oxygen, nitrogen, and other gases when heated to form oxides and nitrides. When the temperature exceeds 800°C, hafnium will rapidly oxidize to form HfO2.

Hafnium has good corrosion resistance, it does not react with dilute hydrochloric acid, dilute sulfuric acid, and alkaline solutions, but is soluble in hydrofluoric acid and aqua regia.

chemical composition(PPM):

Element Fe Cr Mo Al Ti Mn Ni U Cu Sn Sb W
content Max 100 5 10 5 10 5 12 1 5 5 5 5
Element Pb Bi Mg P Si S Nb B Cd Be Ca Li
content Max 5 5 5 5 10 5 5 5 1 5 5 5
Element Zn Na V K N C H O / / / /
content Max 5 5 5 5 50 50 20 300 / / / /
Element Zr
content Max Zr…..

Service:

If the customer purchases for the first time, our company can make samples according to the drawings and provide the customers with samples.
Our company can also be according to map the processing element hafnium material, simply customer drawings.